A new technical paper titled “Controlling Speckle Contrast Using Existing Lithographic Scanner Knobs to Explore the Impact on Line Width Roughness” was published by researchers at Samsung, ASML and ...
TOKYO (Reuters) - Semiconductor equipment maker ASML has sharply reduced defect rates in chips produced by a new lithography tool that uses cutting-edge immersion technology, Belgian research group ...
Some results have been hidden because they may be inaccessible to you
Show inaccessible results