In this interview, AZoM talks to Bas Derksema about advancements in plasma etching and deposition processes for compound semiconductor materials applications. Please could you introduce yourself and ...

For the first time in history, a pathway for ALD-enhanced materials to be rapidly developed and transitioned from lab-scale to commercial production is available for nearly any application. Until ...

For years, the industry has been working on an advanced technology called area-selective deposition for chip production at 5nm and beyond. Area-selective deposition, an advanced self-aligned ...

Researchers from ten countries assessed the prospects of using vapor-based deposition processes to put perovskite thin film processing on the fast track to commercialization, drawing attention to its ...

Imagine being able to deposit a film of material just a few atomic layers at a time. As impossible as that sounds, atomic layer deposition (ALD) is a reality. In fact, it’s being used in an ...

Atomic layer deposition (ALD) originated from atomic layer epitaxy, which was introduced in 1970 and initially used in electroluminescent displays. It rapidly revolutionized semiconducting ...