Intel's newest CEO, Lip Bu-Tan, took the helm in March 2025 and doubled down on its commitment to manufacturing its own chips ...

Intel's foundry arm says it has crossed a major lithography milestone: it has announced successful acceptance testing of ASML's TWINSCAN EXE:5200B High Numerical Aperture (High-NA) EUV scanner, one of ...

Intel announced that it had installed ASML's Twinscan EXE:5200B, the industry's first High-NA lithography tool with 0.55 numerical aperture projection optics made for commercial chip production. The ...

There is a new type of EUV lithography using only four reflective mirrors overturns conventional technology and will contribute to advanced semiconductors at 7nm and below. Professor Tsumoru Shintake ...

Intel has completed acceptance testing of the industry's first commercial high-NA EUV lithography system with a numerical aperture of 0.55, the ASML Twinscan EXE:5200B, laying the foundation for mass ...

Built on Samsung’s third-generation 4nm EUV FinFET process, the Exynos 1580 introduces a new CPU architecture. It uses a tri-cluster design with one high-performance Cortex-A720 core clocked at 2.9 ...

Chinese electronics giant Huawei is testing elements for an extreme ultraviolet (EUV) lithography machine at its Dongguan facility, according to two sources posting photographs on X social media. The ...

TSMC reiterated its long-known stance on next-generation High-NA EUV lithography tools at its European Technology Symposium in Amsterdam. The company does not require these highest-end lithography ...

TL;DR: Samsung plans to expand the use of ASML's High-NA EUV lithography machines in its South Korean labs to accelerate 2nm GAA semiconductor process development. This strategic move aims to enhance ...