Electronics Weekly

Imec and ASML pattern sub-20nm pitch metal layers in one exposure using High NA

Imec and ASML have patterned structures using High NA with the 0.55NA EUV scanner down to 9,5nm (19 nm pitch), random vias with 30nm center-to-center distance, 2D features at 22nm pitch, and a DRAM ...
Optics

Imec and Bühler Leybold enable high-throughput manufacturing of filter-on-chip CMOS sensors

LEUVEN (Belgium) and ALZENAU (Germany) – Bühler Leybold Optics, a supplier of cutting-edge thin-film vacuum coaters and imec, a world-leading research and innovation center in nanoelectronics, ...
Optics

imec creates novel logic and DRAM structures by high-NA EUV lithography

Research and innovation hub imec has produced patterned structures obtained after exposure with the 0.55NA EUV scanner in the joint ASML-imec High NA EUV Lithography Lab in Veldhoven, the Netherlands.
Electronics Weekly

Imec hyperspectral sensor on board IPERLITE mission

The IPERLITE mission is an in-orbit demonstration (IOD) flight designed to demonstrate next-generation hyperspectral imaging technology in space from an orbit of 510 km. At the core of the IPERLITE ...