Configuration of Thin Film Deposition Sputter Systems It is possible to configure thin film deposition sputter systems with many different hardware or software options, which include substrate pre ...

Tokyo, Japan - Researchers from Tokyo Metropolitan University have used high power impulse magnetron scattering (HiPIMS) to create thin films of tungsten with unprecedentedly low levels of film stress ...

Sputtering is a well-known physical vapor deposition (PVD) method finding use in several product applications. While commercial sputter systems are designed for large scale production volume of proven ...

The laboratory sputtering systems Z400 and Z400neo (Systec SVS vacuum coatings, Karlstadt, Germany) have 2 sources with HF, DC or pulsed power supply (100W to 3000 W), BIAS voltage on the substrate, ...

Sputtering targets are the source materials for the preparation of sputtered thin films. In particular, high-purity sputtering targets are used in the physical vapor deposition (PVD) process for the ...

The MEGA coating system (multi-source magnetron sputtering system) enables the production of new types of metallic or ceramic coatings in monolithic, graded or multi-layer arrangements using 7 ...

Back gating, body bias, substrate bias, and back bias all refer to a technique for dynamically adjusting the threshold voltage of a CMOS transistor. CMOS transistors are often thought of as ...

(Nanowerk News) Researchers from Tokyo Metropolitan University have used high power impulse magnetron scattering (HiPIMS) to create thin films of tungsten with unprecedentedly low levels of film ...